| abstract |
(57) [Abstract] [Problem] To develop a small amount of many kinds of semiconductor devices in a short time, In addition, an optimum photomask for manufacturing at low cost is realized. SOLUTION: A light shielding pattern 2 of a photomask M is For example, an organic film such as a photoresist film contains a particulate matter such as carbon. The pattern is transferred to the photoresist 6 on the semiconductor wafer 5 by the reduced projection exposure using the photomask M. At the time of this exposure processing, for example, i-line, K rF excimer laser and ArF excimer laser light, etc. Exposure light can be selected in a wide wavelength range. |