Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F283-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F283-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G65-40 |
filingDate |
2000-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f07e51afdf7d05bd6286bcdce8196bfd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bee50e65447e045d4dacda0c23cbbbf7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0006d16911d2cd9218ae7f24b8d6b57 |
publicationDate |
2002-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2002076115-A |
titleOfInvention |
Etching stopper |
abstract |
(57) [Problem] To provide a coating film for reducing damage due to etching treatment of an interlayer insulating film or a barrier film in a semiconductor element or the like. SOLUTION: An etching stopper film obtained by applying and baking a solution containing (A) an aromatic polyarylene and / or an aromatic polyarylene ether and (B) an organic solvent. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1382549-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5621847-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101007819-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012005346-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006328412-A |
priorityDate |
2000-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |