| abstract |
(57) Abstract: A chemically amplified positive resist composition containing a resin and an acid generator, which is suitable for excimer laser lithography such as ArF or KrF. Provided is a positive resist composition which has good performance and gives particularly improved line edge roughness. A chemically amplified positive resist composition comprising a resin which becomes alkali-soluble by the action of an acid, an acid generator, and cyclohexanols. |