| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1999-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6250bebc63b004ae54c84bd1f817db27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9f8cdcb3666e03b4813f8a1a61316f9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c12385bffcd4e345553edf0e4d2ec3cc |
| publicationDate |
1999-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H11282167-A |
| titleOfInvention |
Photosensitive composition |
| abstract |
(57) [Problem] To provide a positive photosensitive composition capable of forming a resist pattern having a rectangular cross section and constant dimensional accuracy with high sensitivity even in electron beam exposure. SOLUTION: An alkali-soluble resin in which a part or all of an alkali-soluble group is protected by a substituent which can be decomposed by an acid, a compound which generates an acid by irradiation with actinic radiation, and water which is generated by the action of an acid catalyst. And a compound. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4604367-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012073402-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016528305-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9650357-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001343750-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8722319-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014208076-A1 |
| priorityDate |
1998-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |