http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000298349-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2000-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6a6ba714d1a218f4470e9ac84cf1427 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7674891d16799e8b640d439103d1519f |
| publicationDate | 2000-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2000298349-A |
| titleOfInvention | Positive radiation-sensitive resin composition |
| abstract | (57) Abstract: A radiation-sensitive resin capable of forming a resist pattern thinner than a mask dimension with high sensitivity, having a large depth of focus, and forming a resist pattern having a good shape without side wall roughness. A composition is provided. SOLUTION: (A) A phenolic hydroxyl group-containing alkali-soluble resin in which at least a part of the hydroxyl group is protected by an acid-decomposable protecting group and (B) a compound which decomposes by actinic rays or radiation to generate an acid. In the positive radiation-sensitive resin composition to be contained, the resin (A) contains, as an essential component, a group represented by the following general formula (I) as an acid-decomposable protecting group, (However, R 1 and R 2 independently represent a hydrogen atom, an optionally substituted alkyl group or an optionally substituted alkoxy group, and R 3 represents an optionally substituted alkyl group.) A positive radiation-sensitive resin composition, wherein the resin composition contains (C) an aliphatic polyhydric alcohol in an amount of 0.5 to 20% by weight based on the solid content of the resin composition. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7255971-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001343750-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007206551-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4511383-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8795945-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4604367-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8211614-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006235076-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009545768-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7235341-B2 |
| priorityDate | 1999-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 269.