Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d652f9095aa3c4510ff17ba0a1835d2a |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-033 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02189 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31604 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31691 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02159 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02178 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02186 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02183 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-022 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8242 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-24 |
filingDate |
2000-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5194162e80f0c4d36ee765f34d0abe26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3f4c01475aa309558b474470129ed61 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6baa4835f68f626f365fc9d2e18da9f3 |
publicationDate |
2001-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2001200363-A |
titleOfInvention |
Conformal thin films on textured capacitor electrodes |
abstract |
(57) Abstract: A method for forming a capacitor in an integrated circuit is provided. The method includes constructing a bottom electrode that includes a textured silicon layer; and depositing a dielectric layer on the textured silicon layer, wherein the deposition is performed on a first reactant species. Forming a monolayer of less than or equal to about one of the first material on the textured silicon layer by exposure of the first material; and reacting the second reactant species with the first material; Including leaving no more than about one monolayer of the second material. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4621241-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013002285-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005509093-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004296814-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010528118-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007274002-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005509287-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013002285-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4563655-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005521792-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017126207-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7141846-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004327607-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9677001-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4746269-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005537639-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008124474-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022049459-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022038450-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9909062-B2 |
priorityDate |
1999-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |