| abstract |
(57) 【Abstract】PROBLEM TO BE SOLVED: Photosensitivity capable of easily forming a fine patterned thin film excellent in flatness, heat resistance, transparency, chemical resistance and the like and having low dielectric property. A resin composition is provided. SOLUTION: An alkali-soluble alicyclic olefin polymer obtained by subjecting an alicyclic olefin polymer to a modification reaction with a compound having an acid derivative type residue such as an amide group or a carboxyl group, alkoxymethylated melamine or alkoxymethyl A photosensitive resin composition containing a crosslinking agent such as a modified glycoluril and a photoacid generator such as a halogen-containing triazine compound is obtained. |