| abstract |
(57) Abstract: inexpensive, excellent resist pattern shape and the dry etching resistance, and a high resolution property, excellent SEM resistance, particularly for KrF laser or for F 2 laser following short wavelength A photosensitive substrate, a method for forming a resist pattern using the same, and a positive resist composition. SOLUTION: A resist layer is formed on a substrate by 500 to 5800. Å, wherein the composition for the resist layer comprises (A) a compound capable of generating an acid upon irradiation with radiation, (B) an alkali-soluble novolak resin, and (C) at least It comprises a compound having one acid dissociable, dissolution inhibiting group and capable of generating an organic carboxylic acid by dissociation of the dissolution inhibiting group by the action of an acid generated from the component (A). This photosensitive substrate, selective exposure by KrF excimer laser or F 2 laser following short-wavelength light, sequentially subjected to post-exposure baking and alkali developing, a resist pattern. |