| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c72ad459cfacb1b12892184f81257195
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4e5cd717521c765de00ff8c6ce7b545f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4fa8708ef1ed0ac7cd2fe08655eb7c51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_068bd02968f0df46131a331ddcf56db3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_93eaf3421fc4f57e11d8b7529b29d23d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07J9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-753
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-757 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07J9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2006-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43aaad28e7f2e38cc6c0f30db9f62d20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99cc5b03956dcbbd00df6de8bb398203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5bef014caf203ecbfbfc95917df4096e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b29fb4dec90a3b89e74f77e762ffe877
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60271b2ad1f0f41a6b7d5671c137d31f |
| publicationDate |
2006-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2006112446-A1 |
| titleOfInvention |
Compound, dissolution inhibitor, positive-working resist composition, and method for resist pattern formation |
| abstract |
This invention provides a positive-working resist composition, which uses a low-molecular material as a base component and can form a high-resolution resist pattern, and a method for resist pattern formation, a compound suitable for the positive-working resist composition, and a dissolution inhibitor. The compound is a nonpolymer having a molecular weight of 500 to 3000 and is decomposed by the action of an acid to give two or more molecules of a decomposition product having a molecular weight of not less than 200. The dissolution inhibitor contains the compound. The positive-working resist composition comprises the compound and an acid generating agent component. In the method for resist pattern formation, the positive-working resist composition is used. |
| priorityDate |
2005-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |