| abstract |
PROBLEM TO BE SOLVED: To provide an excellent coating property and a uniform photoresist film, because it does not cause drop mark unevenness or radial unevenness (striation), and is particularly useful for LCD and LSI manufacturing. A positive photoresist composition is provided. SOLUTION: With respect to a basic composition comprising an alkali-soluble novolak type resin and a quinonediazide group-containing compound, A positive photoresist composition comprising a surfactant, wherein the surfactant comprises a specific nonionic surfactant and a fluorine-based surfactant. |