http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009031351-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2007-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_273d8650c2c2f123e39c9e8d9c3119a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc7c3e7155aac42b3e1253dd35ff2cb9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83107856499a80b6686496ee39f17cc2 |
| publicationDate | 2009-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2009031351-A |
| titleOfInvention | Positive photoresist composition and resist pattern forming method |
| abstract | Provided are a positive photoresist composition and a resist pattern forming method capable of reducing the amount of a coating solution when applied on a support and improving the uniformity of a resist film thickness. An alkali-soluble novolak resin (A), a naphthoquinonediazide group-containing compound (C), an organic solvent (D), and a general formula (E1-0) [wherein Rf is fluorine having 1 to 6 carbon atoms] R 11 is an alkylene group having 1 to 5 carbon atoms or a single bond. ] A positive photoresist composition comprising a fluorine-based surfactant (E1) having an alkylene oxide chain containing a group represented by the formula: [Chemical 1] [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8790859-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010167476-A1 |
| priorityDate | 2007-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 190.