Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0112 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00619 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-465 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-465 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 |
filingDate |
1997-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2000-02-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2000502512-A |
titleOfInvention |
Method for anisotropic plasma processing of various substrates |
abstract |
(57) Abstract: The present invention relates to a method for producing in a substrate an etched structure using anisotropic plasma processing, in which case it is alternatively or separately provided independently of each other. An anisotropic etching step and sidewall passivation are performed, wherein the substrate (2) is a polymer, metal or multi-component system and the sidewall passivation layer applied during the sidewall passivation A portion (8) of (6) is provided on each exposed side (7 ') of the side wall (7) during the next etching step, whereby the whole process is made anisotropic. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I475335-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002543611-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008126374-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012209290-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002134470-A |
priorityDate |
1996-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |