abstract |
PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition having excellent adhesion to a substrate and dry etching resistance, and also having improved sensitivity and resolution. SOLUTION: It has a polymerized unit of 2-hydroxyethyl methacrylate and a polymerized unit having an acid-labile group, and is itself insoluble or hardly soluble in alkali, but is unstable to the above-mentioned acid by the action of an acid. The present invention provides a chemically amplified positive resist composition containing a resin which becomes alkali-soluble after a basic group is cleaved, and an acid generator. The resin may also comprise other units, for example 3-hydroxy-1-adamantyl (meth) acrylate, α- (meth) acryloyloxy-γ-butyrolactone, in which the lactone ring may be substituted with alkyl, It may have a polymerization unit of a monomer such as maleic anhydride. |