| abstract |
(57) [Abstract] (with correction) PROBLEM TO BE SOLVED: To obtain a polymer compound for photoresist excellent in etching resistance, in which each monomer unit is not unevenly distributed, has a small composition distribution between molecules or within a molecule, and is excellent in etching resistance. SOLUTION: (A) at least one kind of (meth) acrylic ester having an adamantane ring having a substituent represented by at least one of formulas (1), (B) and (C) and (C) of formula (4); A polymer compound for a photoresist obtained by copolymerizing a monomer mixture containing an acrylate ester. (R 2 , R 12 and R 13 are hydrogen or a hydrocarbon group having 1 to 3 carbon atoms. R 14 is a hydrocarbon group having 6 to 2 carbon atoms. A bridged alicyclic hydrocarbon group of 0; R 16 is a methyl group or the like. R 18 , R 19 is hydrogen, hydroxyl, oxo or carboxyl. However, R 18 and R 19 are not simultaneously hydrogen. p, q, r and s are 0 or 1. However, p + q + r + s = 2-4) |