http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000195840-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67063 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 1998-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d2f983fc307994dde66ad758b159cec |
| publicationDate | 2000-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2000195840-A |
| titleOfInvention | Etching apparatus and etching method |
| abstract | (57) [PROBLEMS] To efficiently etch a film formed on a wafer in an etching apparatus used for manufacturing a piezoelectric element, a semiconductor element, or the like. An inner hollow bell jar 16 having an opening at a lower portion, a wafer mounting table 11 disposed inside or below the bell jar 16, a space between the wafer mounting table 11 and the bell jar 16, and The gas concentrator 17 includes a dome-shaped gas concentrator 17 having an opening 17a at an upper portion, and a gas inlet 12 disposed between the gas concentrator 17 and the bell jar 16 on the side of the gas concentrator 17. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008517453-A |
| priorityDate | 1998-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.