http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000156372-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c5520dd38cc403678d9f91e0b0ee95fb
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
filingDate 1998-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfbfdd9816d6131f0326502828c91f0a
publicationDate 2000-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2000156372-A
titleOfInvention Plasma processing equipment
abstract (57) Abstract: Provided is a plasma processing apparatus capable of forming a film having a uniform film quality and thickness even on a substrate having a large area such as a substrate for a liquid crystal display panel. A load lock chamber, a plasma chamber, and a process chamber each having a vacuum maintained therein. The load lock chamber 1 is provided with an exhaust port 4, and the process chamber 3 is provided with a heater 5 for heating the substrate 13, a stage 6 for transporting the substrate 13, and an exhaust port 7. The plasma chamber 2 includes a quartz glass window 8 for introducing high-frequency power for plasma generation, a resonator 9 for coupling high-frequency power to plasma, a gas inlet 10 for plasma generation, and a process gas inlet 11. Provided. Further, a plate 12 provided with mesh or slit-shaped holes is attached to the plasma chamber 2. The plate 12 is detachable, and the opening shape, the opening ratio, or the thickness of the plate 12 can be changed.
priorityDate 1998-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 21.