http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2322734-A

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3105
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
filingDate 1997-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83873cc07a39a6847242392bb6b3a736
publicationDate 1998-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber GB-2322734-A
titleOfInvention Semiconductor device and a method of manufacturing the same
abstract In a method of manufacturing a semiconductor device, a BPSG film is formed as an interlayer insulating film. A process is then applied to the BPSG film for making a surface of the BPSG film hydrophobic. This process comprises supplying an organic compound gas such as ethyl alcohol gas, and a gas containing O 2 and O 3 and is carried out, at a temperature equal to or higher than that used in BPSG film formation. Then, the BPSG film is reflowed such that the BPSG film surface is flattened. Segregation of B and P atoms is thereby prevented.
priorityDate 1997-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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