| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| filingDate |
2001-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_707b65ed537e0dcdcd0ac90952ad93d5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bee50e65447e045d4dacda0c23cbbbf7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f07e51afdf7d05bd6286bcdce8196bfd |
| publicationDate |
2001-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-1148105-A2 |
| titleOfInvention |
Composition for film formation, method of film formation, and silica-based film |
| abstract |
A composition for film formation which comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of (A-1) compounds represented by the following formula (1) RaSi(OR<1>)4-a (A-2) compounds represented by the following formula (2) Si(OR<2>)4 and (A-3) compounds represented by the following formula (3) R<3> b (R<4>O) 3-bSi-(R<7>)d-Si (OR<5>)3-cR<6> c (B) at least one member selected from the group consisting of compounds of the metals in Groups IA and IIA of the periodic table; and (C) an organic solvent. A method for film formation using the composition and a silica-based film obtained by the method are also disclosed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007075604-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7601792-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3838989-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8748554-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1926209-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1559760-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1858996-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1858996-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2602278-A1 |
| priorityDate |
2000-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |