| abstract |
A positive-working photoresist composition comprisesn(A) a resin comprising the specific repeating structuralnunits which resin increases in its solubility in annalkaline developer when acted upon by an acid, (B') annonium salt compound which generates an acid when irradiatednwith active ray or radiation and (C) at least one ofnfluorine-based and/or silicon-based surface active agentnand nonionic surface active agent or a positive-workingnphotoresist composition comprises (A) a resin comprisingnthe specific repeating structural units which resinnincreases in its solubility in an alkaline developer whennacted upon by an acid, (B) a compound which generates annacid when irradiated with active ray or radiation, and (D)na mixed solvent containing at least one propylene glycolnmonoalkyl ether carboxylate and at least one of solventsnselected from the group consisting of propylene glycolnmonoalkyl ether, alkyl lactate and alkoxyalkyl propionatenand solvents selected from the group consisting of γ-butyrolactone,nethylene carbonate and propylene carbonate. |