http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10142600-B4
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36f8253f3d0d59bcd9259217d4385d10 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2001-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f7753adcc5068db955dcc81f931d850 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33319a0edd0d6851d28aaacab3a60d9d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f9d76549ee448b7df8679effef0f40f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aaa9fe0ea165caddb81913f4e64127a5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01522cb504718b648422ee782a37f95b |
| publicationDate | 2007-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | DE-10142600-B4 |
| titleOfInvention | Silicon-containing resist for photolithography at short exposure wavelengths |
| abstract | Chemically enhanced photoresist comprising: a polymer having acid labile radicals attached to a polar group such that after cleavage of the acid labile radicals the solubility of the polymer in polar developers is increased, and further having anchor groups to which a linking group of an amplification agent can be attached the polymer contains the following repeating units: first repeating units which have a structure of the formula I, FORMULA I in which means: A: a single bond, -O-; B: - (CR 5 R 6 ) n -, - (O- (CR 5 R 6 )) n -, a cycloalkylene group having 5 to 20 carbon atoms, an arylene group having 6 to 22 carbon atoms; R 1 is -H, an alkyl group of 1 to 10 carbon atoms, -CN, -CF 3 ; R 2 , R 3 , R 9 : an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 5 to 20 carbon atoms, an aryl group having 6 to 22 carbon atoms, these groups also having one attached via an ether or ester bond or via an acetal bond, can carry acid-cleavable group; a... |
| priorityDate | 2001-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 74.