| abstract |
Positive as well as negative radiation sensitivenresin compositions that, in addition to being capable ofnproviding excellent resolution and pattern profile, arenparticularly excellent in avoiding the problems ofn"nano-edge roughness" or "coating surface roughness". Thenpositive type radiation sensitive resin compositionncomprises (A) (a) an acid-decomposable group-containingnresin, or (b) an alkali-soluble resin and an alkalindissolution controller, and (B) a photoacid generatorncomprising "a compound that upon exposure to radiationngenerates a carboxylic acid having a boiling point of 150°Cnor higher", and "a compound that upon exposure to radiationngenerates an acid other than a carboxylic acid". Thennegative type radiation sensitive resin compositionncomprises (C) an alkali-soluble resin, (D) across-linkingnagent, and the component (B) as described above. |