| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3bf96311fde209e9fad008b4b8616252 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
1999-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa2be72821bb0b8f1907e5dae7311041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f4407223306efb201fdc9840f054ee3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d37d5a6509cda391922baa43d99b22b2 |
| publicationDate |
2000-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0989459-A1 |
| titleOfInvention |
Chemically amplified resist composition |
| abstract |
A chemically amplified resist composition is disclosednwhich shows a high sensitivity, high resolution, excellentnprocessing adaptability and excellent processing stability,nwhich can form good pattern profile and which is suited as anfinely processable material for use in manufacturing integratedncircuit elements or the like. The chemically amplified resistncomposition comprises at least (a) an organic materialncontaining a substituent or substituents capable of beingnreleased in the presence of an acid and (b) compounds capablenof generating an acid upon exposure to radiation (acid-generators),ncomposed of at least one onium salt and at leastnone of sulfone compounds and sulfonate compounds. Thisnchemically amplified resist composition preferably furtherncontains a basic compound. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6723483-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6492091-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1113005-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10243742-B4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1434091-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1434091-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1179750-A1 |
| priorityDate |
1998-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |