| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76889
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28061
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28518 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
1996-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a34fbeed0670695f0977d9c938dd1090
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff56af4316416f843fcec9d940aaf9aa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40f39f1488387ed6486a0171518e154b |
| publicationDate |
1997-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0772231-A2 |
| titleOfInvention |
A method of forming a low stress polycide conductors on a semiconductor chip |
| abstract |
A method of forming low resistivity conductive lines on a semiconductor substrate is disclosed. In practicing the method a multichamber tool is used to advantage by forming a first doped polysilicon layer on the surface of a substrate, forming a second undoped layer on the doped layer, while maintaining the work piece under a vacuum environment, moving the substrate to a second chamber and thereafter forming a silicide containing layer on the undoped polysilicon layer. various techniques may be used to deposit either the polysilicon or the silicide layer such as sputtering may also be used. Practice of the method eliminates separation of silicide from polysilicon and increases product yield. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0905750-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0905750-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9917347-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0865074-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2374087-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6479373-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1120523-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6221771-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6693022-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0917185-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6642606-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6451694-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2374087-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0865074-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6867113-B1 |
| priorityDate |
1995-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |