| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c0aa4909604b53e92db230cad6ecf893 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
1988-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8bbd584b1f7f882457badb4eda572f04 |
| publicationDate |
1988-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
EP-0295581-A1 |
| titleOfInvention |
Process for etching aluminum in a plasma |
| abstract |
The addition of bromine, or bromides, to the gas mixture in a plasma has been found to significantly improve selectivity when etching aluminum. Processes are disclosed based upon bromine etch gases and chlorine based etchants wherein bromine is a small but significant additive. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0522532-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0522532-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0936679-A1 |
| priorityDate |
1987-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |