http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-205741207-U
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_65682d3e437c225d79b93953b4b26392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-27 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505 |
| filingDate | 2016-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2016-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31447f62f47d2fe1ceb180e512885908 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_633276586b3c5d57619e24a93f46de0c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_afafa587f047a16a44147a363941dcd7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa7d976c5352e42e405b379ff8a9375c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32e79fd3f2f3d2312cf6e5e156922de1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e47c97cb2cc03d809f8efcc223dd0f9f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7fcc409b39ec5aca1319423d7ff04497 |
| publicationDate | 2016-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-205741207-U |
| titleOfInvention | Helicon wave plasma chemical vapor deposition unit |
| abstract | This utility model relates to a kind of Helicon wave plasma chemical vapor deposition unit, the vacuum deposition chamber being connected with described vacuum discharge room including vacuum discharge room, described vacuum discharge outdoor is surrounded with coil, described vacuum discharge indoor are provided with the first air inlet pipe, dextrorotation antenna, it is arranged with shielding cylinder outside described dextrorotation antenna, one end of described dextrorotation antenna through a shielded-plate tube and is connected with radio-frequency power supply, described vacuum moulding machine indoor are provided with chip bench, the second air inlet pipe, and described vacuum deposition chamber is connected by pipeline vacuum elements.This utility model simple in construction, easy to use, by at vacuum discharge indoor generation Helicon wave plasma, it has been successfully obtained nanocrystalline diamond film in vacuum moulding machine indoor, the nanocrystalline diamond film purity prepared is high, quality is good, easily realize in commercial production, sedimentation rate is fast, the problem that there is not filament performance degradation, and simple to operate, easy to control. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108085657-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115110025-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115110025-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023093283-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113219588-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108085657-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111725099-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111725099-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113219588-B |
| priorityDate | 2016-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.