| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F224-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F224-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 |
| filingDate |
2017-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc5ec654fdab69aba5e5ee430a267bb4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1037a749a7d25144305b690cd1dbda52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0ac96f61e2222852f331ec0ed094e4 |
| publicationDate |
2019-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-109803990-A |
| titleOfInvention |
Method for producing resin and method for producing photosensitive radiation-sensitive or radiation-sensitive composition |
| abstract |
The present invention provides a method for producing a resin capable of forming a resist film having excellent resolution and reducing scum at the time of patterning, and a method for producing a photosensitive radiation-sensitive or radiation-sensitive composition. The method for producing the resin produces a resin comprising a repeating unit represented by the general formula (1) and a repeating unit including a group that is decomposed by the action of an acid to generate a polar group, and the method includes the steps of: first In a first step, a resin precursor containing a repeating unit represented by the general formula (2) and a repeating unit containing a group that is decomposed by the action of an acid to generate a polar group is obtained; and in the second step, an acid or a base is used to The group represented by -OY in the repeating unit represented by the general formula (2) in the resin precursor is deprotected to obtain the repeating unit represented by the general formula (1). |
| priorityDate |
2016-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |