| abstract |
Described herein are compositions and their use to form silicon-containing films (such as, but not limited to, silicon oxide, silicon nitride, silicon oxynitride, carbon-doped nitride, etc.) on at least one surface of a substrate having surface features. Silicon or carbon doped silicon oxide film) method. In one aspect, the composition comprises at least one compound selected from the group consisting of siloxanes, trisilylamine-based compounds, organoaminodisilane compounds, and cyclic trisilazane compounds. |