| abstract |
A resin composition for photoresists which comprises a polymer having an adamantane skeleton and represented by formula (1) and a photo-acid generator. In formula (1), R1 represents hydrogen or methyl; R?2, R3, and R4¿ are the same or different and each represents hydrogen, halogeno, alkyl, hydroxy, hydroxymethyl, carboxy, or a functional group which undergoes elimination by the action of an acid to generate a hydroxyl, hydroxymethyl, or carboxyl group, provided that at least one of R2 to R4 is the functional group; X represents an ester or amide bond; and m and n each is 0 or 1. The composition has high resistance to etchants, becomes soluble upon irradiation with light, and can form a fine pattern. |