http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9847943-A1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_260220c525b214105ee48ee2d77a5bf4 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-312 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-12 |
filingDate | 1998-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d2a3df6c923b679195be8c058afe429 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bdc70de6999aaf1cbe8a6e0828fa91e3 |
publicationDate | 1998-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | WO-9847943-A1 |
titleOfInvention | Stable inorganic polymers |
abstract | Processes for producing poly (hydrido siloxane) copolymers and processes for producing solutions of such copolymers for coating semiconductor substrates are provided. The copolymers have the general formula: (HSiO1.5)a(HSiO(OR))b(SiO2)c, wherein R is a mixture of H and an alkyl group having between 1 and 4 carbon atoms; a + b + c = 1; 0.5 < a < 0.99; 0.01 < b < 0.5; and 0 < c < 0.5. Processes for producing the copolymers use alkoxysilanes as starting materials. Processes for producing coating solutions include removal of water and alcohol. Films of such coating solutions are useful as planarizing dielectric layers. |
priorityDate | 1997-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 95.