| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_031a603a59dcf8845b0f47bcdd47072f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dca876aa7b5cc3c46f1ce987b82761bb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b7e68fd8657d0fe36c77b24d1589fdab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2c44b38b49a64da79838a9ede45565c7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31536 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F290-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D167-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D163-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D175-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-81
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00 |
| filingDate |
1997-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33cf7038773898ff543d36bdae58bc6b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97608271f049b2b78e0e3597b32c2acf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47d2b2e39348832d067bd92b3c5129ee |
| publicationDate |
1997-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-9746594-A1 |
| titleOfInvention |
Process for the synthesis of resins containing unsaturations of the (meth)acrylic type to be cured by radiation or heat and used for powder paints |
| abstract |
This invention is characterized by the fact that resins comprising (meth)acrylic unsaturations are obtained by reacting functional groups of unsaturated monomers without solvents at temperatures above 150 °C and under controlled heat exchange, while maintaining intact their unsaturations, with functional groups of saturated and/or unsaturated polymers. The technologies and the work cycles used for conventional resins may also be used for these resin types. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6838515-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0196413-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1142915-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0196414-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1142914-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6714712-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7084185-B2 |
| priorityDate |
1996-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |