Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_af99df08b153738cd418446a75d09bfc http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f57d3bf54fbe61e6697d92b758c94952 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a2885fa63451d67fc4c80948d016d7b http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_941d4a4070b4e67e7efa4aa253040861 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4ee0204021c4d0fc7ae9e956f3d7f1cf http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_452e60dcdcccc4668be9c04b1169dcc0 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
1996-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b44a1efd1ea38d2ebed00ce56461f46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2568cce4e7221cfb34e24b29bcaa39ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_021aaf82f37ceddd14679d59aec53c46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9aa5ec1a044f6d653443f480ca0cb13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd3894f7d47bd7e22dc308c028d59e2f |
publicationDate |
1997-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-9722910-A1 |
titleOfInvention |
Solder mask compositions |
abstract |
A process for producing a solder mask comprises: 1) coating a printed wiring board with a solder mask composition comprising an aqueous solution of (1) an aryl cyclic sulfonium zwitterion monomer or (2) an aryl cyclic sulfonium zwitterion and a polymer containing two or more carboxyl groups; 2) exposing the coating to UV light in selected areas to polymerize the zwitterion monomer on the exposed areas; 3) developing the exposed coating with water or alkaline aqueous solution, and 4) curing the developed coating. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006017014-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7914965-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006017014-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100852540-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7235344-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1662317-A3 |
priorityDate |
1995-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |