| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3fd2c3e4b921d922ff4930f0f110c818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_46941d155fa3a30fdb96eeef7cca43cd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f5c80aa85e1b91c32be4359200ecf66b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-68327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-04 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68785
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J7-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09J7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B5-307
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6836 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-687
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09J7-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B5-18 |
| filingDate |
1996-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17aa59e5fd5deec903c7bcf6687185b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_374b70ad408c14f34aaa1159fe3e35be |
| publicationDate |
1996-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-9630163-A1 |
| titleOfInvention |
A wafer retainer for retaining a wafer to be polished and a method for attaching/detaching the wafer retainer to/from a base plate of a polishing machine |
| abstract |
A wafer retainer for retaining a wafer to be polished according to the present invention includes: a foam layer (2) capable of adsorbing a wafer on a surface of the foam layer (2) in a detachable manner; a pressure-sensitive adhesive layer (3) for attaching the foam layer (2) to a base plate (7) of a polishing machine; and a release sheet (4) attached to the pressure-sensitive adhesive layer (3) in a releasable manner, wherein the pressure-sensitive adhesive layer (3) includes an adhesive composition containing a polymer, the polymer having a first-order melt transition in a temperature range narrower than 15 °C. Thus, the present invention provides a wafer retainer and a method for attaching/detaching the wafer retainer to/from a base plate of a polishing machine such that the wafer retainer can be peeled off the base plate by simply cooling the base plate (7) and the adhesive layer (3) of the wafer retainer, thereby facilitating the exchanging or replacement of the wafer retainer occurring after each polishing process. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0012643-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7913595-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6666752-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0017284-A1 |
| priorityDate |
1995-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |