http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022190448-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8fb9f44db08d1c42a53f3d28eaae416f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-308 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-16 |
| filingDate | 2021-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3ecfcac8ccb27321aee1ebb7c8fc012 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9db2deb69c85d94d0efb83c51d33eee6 |
| publicationDate | 2022-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2022190448-A1 |
| titleOfInvention | Etchant composition |
| abstract | In one aspect, an etchant composition that can reduce etching unevenness is provided. In one aspect, the present disclosure relates to an etchant composition for etching a layer of interest containing at least one type of metal, the etchant composition comprising an etching suppressing agent, an acid comprising at least nitric acid, and water, and having a pH value of 1 or less, in which the etching suppressing agent comprises at least one nitrogen-containing compound selected from polyalkylene imine and a polymer containing a diallylamine-derived constituent unit. |
| priorityDate | 2021-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 72.