http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022172734-A1

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a52af89e67b7b044f04d055c573de211
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J9-28
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J9-28
filingDate 2022-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25f581a60c4cd66b7bf125ee717b8af4
publicationDate 2022-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber WO-2022172734-A1
titleOfInvention Polymer composition for porous-film formation, method for producing porous film, porous film, flexible metal-clad laminate, and electronic board
abstract Provided is a polymer composition for forming a porous film which has a low permittivity and a low dielectric dissipation factor and in which problems concerning liquid permeability and water absorption have been mitigated and the fear of decreasing in mechanical strength has been suppressed. The polymer composition for porous-film formation comprises a polymer, a solvent (A), and a solvent (B), wherein the solvent (A) has a boiling point of 100°C or higher, a 10 mass% solution of the polymer in the solvent (A) has a 25°C viscosity of 150 dPa·s or higher, the solvent (B) has a boiling point lower than 100°C, and a 10 mass% solution of the polymer in the solvent (B) has a 25°C viscosity less than 50 dPa·s.
priorityDate 2021-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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