| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2020-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d22cceb2ffa1bbecddc1ce6499d8fb4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d29c65751f4c656134e39293847c110b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d09bfbd4ed144d476b04fe0660adbb2f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_001475ef753f16ecec53ff8d0d4843b5 |
| publicationDate |
2021-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2021020344-A1 |
| titleOfInvention |
Photosensitive resin composition, photosensitive sheet, cured film, method for producing cured film, interlayer insulating film and electronic component |
| abstract |
The purpose of the present invention is to provide a photosensitive resin composition which has good pattern formability, and which enables the achievement of a cured film having a low dielectric constant, a low dielectric loss tangent and high elongatability, said cured film being obtained by curing this photosensitive resin composition. The present invention is a photosensitive resin composition which contains (A) a polyimide precursor and (B) a photopolymerization initiator, wherein: the polyimide precursor (A) contains a polyvalent carboxylic acid residue and/or a polyvalent amine residue having a structure of an alicyclic hydrocarbon having 4 to 8 carbon atoms, said hydrocarbon optionally having an unsaturated bond; and at least four hydrogen atoms in the structure of an alicyclic hydrocarbon are substituted by a hydrocarbon group having 4 to 12 carbon atoms, said hydrocarbon group optionally having an unsaturated bond. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022210532-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023190060-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023190061-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023190064-A1 |
| priorityDate |
2019-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |