http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020259126-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1b0c5c1b0f06e81271b7d4cf5d5fd295 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-083 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2020-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea05cafe7f2dccd66727315b912e8a6a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9089d5b3aaeac94498dc27252d9a3581 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87447b350ccea164ad3de58d085a07a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a25a20b18ccacd38b5c3c07794a8a91e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_439cb61747611e62b9bd2648b5088465 |
| publicationDate | 2020-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2020259126-A1 |
| titleOfInvention | Silicon-containing polyphenyl monomolecular resin and photoresist composition thereof |
| abstract | The present invention relates to a monomolecular resin of general formula (I) or general formula (II), wherein in formula (I), R0 and Ra1-Ra12 are the same or different, and are each independently selected from a hydrogen atom, hydroxyl, C1-15 alkoxy, or -ORb; in formula (II), R0 and Rb1-Rb18 are the same or different, and are each independently selected from a hydrogen atom, hydroxyl, C1-15 alkoxy, or -ORb; the Rb is a group having acid sensitivity; and Rx, Ry, and Rz are the same or different, and are each independently selected from the following unsubstituted or optionally substituted groups: C1-15 alkyl, C3-20 cycloalkyl, C6-20 aryl, 5-20 membered heteroaryl, 3-20 membered heterocyclyl, -C1-15 alkyl-C6-20 aryl, and -C1-15 alkyl-5-20 membered heteroaryl. The monomolecular resin of the present invention has good solubility, is suitable for manufacturing thin films, and has a high glass transition temperature, thereby satisfying requirements of a photolithography process. The present invention also relates to a photoresist composition comprising the monomolecular resin and use thereof. |
| priorityDate | 2019-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 113.