http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107266319-A

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filingDate 2017-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc2a30d7a53e80289bf7df46026fd2a7
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publicationDate 2017-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-107266319-A
titleOfInvention Dendritic polyphenyl substituted adamantane derivative monomolecular resin, positive photoresist composition and negative photoresist composition
abstract The invention discloses a dendritic polyphenyl substituted adamantane derivative monomolecular resin, which has the following molecular structure: Among them, the substituents R a1 to R a28 in formula (I), the substituents R b1 to R b21 in formula (II), and the substituents R c1 to R c14 in formula (III) each independently represent a hydrogen atom, a hydroxyl group, a methyl Oxygen or acid-sensitive substituents, the substituents R a1 to R a28 in formula (I) are the same or different, the substituents R b1 to R b21 in formula (II) are the same or different, and the substituents R c1 in formula (III) ~R c14 are the same or different, and multiple substituents on the same benzene ring cannot be hydrogen atoms at the same time. Dendritic polyphenyl substituted adamantane derivative monomolecular resin in the present invention all has good solubility in various polar solvents, is suitable for making thin film, has very high glass transition temperature simultaneously, can be very fast Good to meet the requirements of the photolithography process.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112142955-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112142955-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020259126-A1
priorityDate 2017-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 28.