abstract |
The present invention addresses the problem of providing a cleaning liquid for a semiconductor substrate, wherein pH variation due to dilution is suppressed. This cleaning liquid is a cleaning liquid for a semiconductor substrate and includes a chelating agent, wherein the acid dissociation constant (pKa) of the chelating agent and the pH of the cleaning liquid satisfy the condition of the following expression (A). (A): pKa-1<pH<pKa+1 |