| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_84918640093390b6910127d649eb7429
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2faba1626c529fc04137d1a99537bef3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3cec1a2292e79af083d24746eb4f4c57
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c52f25399da7b94df5579b681e269dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_566237383474b5cd6c716f88ca25b846
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eb2648e65ad8850515bd727a122f1186
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_320d244ba3d656587723d6ea65264fc3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2006-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B21-0844
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32467
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J3-02 |
| filingDate |
2019-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_057d24f2f670aeebaf1a27ea5924f612
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd67f308041732260a2354c07a940018
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e51db13cfe6bbe5b96558da6dcca95f1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e93ce76502841ba257243441b3074c83
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88f6f95a82391f1e4ce197d6cc0c2adb |
| publicationDate |
2020-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2020131556-A1 |
| titleOfInvention |
Systems and methods for storage and supply of f3no-free fno gases and f3no-free fno gas mixtures for semiconductor processes |
| abstract |
Disclosed are systems and methods for supplying a F 3 NO-free FNO-containing gas and systems and methods for etching using the F 3 NO-free FNO-containing gas. The system comprises a NiP coated steel cylinder with a polished inner surface to store the F3NO-free FNO-containing gas, a cylinder valve to release the F 3 NO-free FNO-containing gas from the cylinder, a manifold assembly, including a pressure regulator and line components to deliver the F 3 NO-free FNO-containing gas to a target reactor. The pressure regulator de-pressurizes the F 3 NO-free FNO-containing gas in the manifold assembly thereby dividing the manifold assembly into a first pressure zone upstream of the pressure regulator and a second pressure zone downstream of the pressure regulator. A gaseous composition comprises F 3 NO-free FNO gas containing less than approximately 1% F 3 NO impurity by volume and an inert gas being capable of suppressing the concentration of F 3 NO impurity in the F 3 NO-free FNO gas. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I815331-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022190809-A1 |
| priorityDate |
2018-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |