Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_98a75c9fff239084cf3c988c59841957 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-153 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02214 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02348 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505 |
filingDate |
2019-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_918b3362c94fd23556a8ad0dde49911e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4997adb0d4eadfd48ad0eab2bc9982a2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_188defd48490e70eee1f39ee7ae27955 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07d58446daf1091289e45f7702d74355 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f73ac0ad0df564f6b90325cf222744c8 |
publicationDate |
2020-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
WO-2020112782-A1 |
titleOfInvention |
1-methyl-1-iso-propoxy-silacycloalkanes and dense organosilica films made therefrom |
abstract |
A method for making a dense organosilicon film with improved mechanical properties, the method comprising the steps of: providing a substrate within a reaction chamber; introducing into the reaction chamber a gaseous composition comprising 1-methyl- 1 -iso-propoxy-silacyclopentane or 1 -methyl-1 -iso-propoxy-silacyclobutane; and applying energy to the gaseous composition comprising 1 -methyl-1 -iso-propoxy-silacyclopentane or 1 -methyl-1 -iso-propoxy-silacyclobutane in the reaction chamber to induce reaction of the gaseous composition comprising 1 -methyl-1 -iso-propoxy-silacyclopentane or 1 -methyl- 1 -iso- propoxy-silacyclobutane to deposit an organosilicon film on the substrate, wherein the organosilicon film has a dielectric constant of from 2.70 to 3.20, an elastic modulus of from 11 to 25 GPa, and an at. % carbon of from 12 to 31 as measured by XPS. |
priorityDate |
2018-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |