| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2019-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1aedc93d49889ca1e20e5162b0a67e51
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d4c9f1226b5cb600c69264c935b9491
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad795f8d18b85ebdc4ed2daab77cd13b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d41b29c5ed6a5acaf463ccc26196f214
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8480941479d47c204fa40dcbe910dc5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f8e6cce869d00b71c3f5f764380c51a |
| publicationDate |
2020-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2020067183-A1 |
| titleOfInvention |
Underlayer film forming composition for multilayer resist processes and pattern forming method |
| abstract |
The purpose of the present invention is to provide: an underlayer film forming composition for multilayer resist processes, which is capable of suppressing the occurrence of a crack in a silicon-containing film during a multilayer resist process, while being capable of reducing warp of a substrate, and which is capable of forming a resist underlayer film that exhibits excellent removability; and a pattern forming method. The present invention is an underlayer film forming composition for multilayer resist processes, which contains a solvent and a polymer having one or more kinds of first structural units that are derived from an acrylic acid ester, and which is configured such that the content ratio of the first structural units relative to all the structural units constituting the polymer is 65% by mole or more. |
| priorityDate |
2018-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |