| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F3-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F3-041 |
| filingDate |
2019-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6778d730f2ee411cce4a50d89168db8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b89d830ab5128f7706f85157699ac6c |
| publicationDate |
2020-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2020066351-A1 |
| titleOfInvention |
Method for manufacturing patterned base material, method for manufacturing circuit substrate, and method for manufacturing touch panel |
| abstract |
A method for manufacturing a patterned base material, and applications therefor, in which the following steps are carried out in this order: a step for bonding a base material to a photosensitive-resin-composition-layer side of a photosensitive transfer material having the photosensitive resin composition layer supported on a temporary support body; a step for stripping away the temporary support body; a step for subjecting the photosensitive resin composition layer to pattern exposure; a step for bonding a protective film to the outermost layer on the pattern-exposed photosensitive resin composition layer side; a step for winding a laminate body in which the base material, the pattern-exposed photosensitive resin composition layer, and the protective film are stacked in the stated order; a step for unwinding the wound laminate and stripping away the protective film; and a step for developing the pattern-exposed photosensitive resin composition layer, thereby forming a pattern of the photosensitive resin composition layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115768838-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022264275-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022059417-A1 |
| priorityDate |
2018-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |