| abstract |
The present invention provides a self-assembled film forming composition for vertically inducing a finer microphase-separated structure of a block copolymer-containing layer with respect to a substrate. The present invention also provides: a method for producing a phase-separated pattern of a block copolymer, which utilizes this composition; and a method for producing a semiconductor device. A self-assembled film forming composition for forming a phase-separated structure of a block copolymer layer on a substrate, which contains a block copolymer and a solvent, and which is configured such that: the block copolymer is obtained by bonding a silicon-free polymer to a silicon-containing polymer that contains, as a constituent unit, styrene that is substituted by a silicon-containing group; the silicon-free polymer contains a structure derived from formula (1-1) or formula (1-2); and the silicon-containing group contains one silicon atom. (In formula (1-1) or formula (1-2), each of R1 and R2 independently represents a hydrogen atom, a halogen atom or an alkyl group having 1-10 carbon atoms; and each of R3-R5 independently represents a hydrogen atom, a hydroxy group, a halogen atom, an alkyl group having 1-10 carbon atoms, an alkoxy group having 1-10 carbon atoms, a cyano group, an amino group, an amide group or a carbonyl group.) |