| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_154f5a8a983d88f296117dcc92946ab4 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06 |
| filingDate |
2019-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2bf0c0d8a75d0a751edf7f13c51c5937
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3fae0a762452f7b8f5ffab48dfbf8797
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9750f623c3e11455441493be24255ab3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7659f1889b34f6f6b03c61112b2db789
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10234d3630fdf0d79b7f1c8f6a707675
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_006ceab1133b0348418445a426308804 |
| publicationDate |
2020-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2020013485-A1 |
| titleOfInvention |
Composition for etching silicon nitride film and method for etching silicon nitride film by using same |
| abstract |
Provided are a composition for etching a silicon nitride film and a method for etching a silicon nitride film by using same, the composition comprising: an inorganic acid or a salt thereof; water; a compound of chemical formula 1; a compound of chemical formula 2; and the reaction product of the compound of chemical formula 1 and/or the reaction product of the compound of chemical formula 2. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115894077-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115894077-B |
| priorityDate |
2018-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |