http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019225055-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5d04736b0b882a4f5a1e0e0e4cd8cbb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L51-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F283-01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F290-062 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F290-067 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L67-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D18-0009 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-06 |
| filingDate | 2019-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c046f2a6068ce462f4f3b321232edcdc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_131963195b45137087b0de0f1ba5d363 |
| publicationDate | 2019-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | WO-2019225055-A1 |
| titleOfInvention | Resin composition, polishing pad, and method for producing polishing pad |
| abstract | Provided are: a resin composition for easily giving polishing pads which have a hardness suitable for chemical mechanical polishing and have voids of a desired size; a polishing pad produced from the resin composition; and a method for producing the polishing pad. The resin composition comprises a urethane (meth)acrylate (A), at least one unsaturated resin (B) selected from among vinyl ester resins and unsaturated polyester resins, an ethylenically unsaturated compound (C) which has an ethylenically unsaturated bond and is neither the urethane (meth)acrylate (A) nor the unsaturated resin (B), and a hollow object (D), wherein the mass ratio of the content of the urethane (meth)acrylate (A) to the content of the unsaturated resin (B), A:B, is 64:36 to 96:4 and the content of the hollow object (D) is 0.7-9.0 parts by mass per 100 parts by mass of the sum of the urethane (meth)acrylate (A), the unsaturated resin (B), and the ethylenically unsaturated compound (C). |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210062392-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022045018-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102293765-B1 |
| priorityDate | 2018-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 135.