| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5128cfc84a0fb189fceb3cd240c44493 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| filingDate |
2018-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33feb1d6ee6d5be35d6b92488098b03b |
| publicationDate |
2019-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
WO-2019124452-A1 |
| titleOfInvention |
Photosensitive resin laminate |
| abstract |
Provided is a photosensitive resin laminate which prevents generation of resist projection, which provides a preferable resist pattern shape, and with which good productivity can be obtained. A photosensitive resin laminate according to one embodiment of the present invention is provided with a support film and a photosensitive resin composition layer formed on the support film, wherein the support film contains fine particles, and includes a region where the total area ratio of optical anomaly regions is not more than 300 ppm when observation is made in an area of 13.5 mm2 of the support film using an epi-illumination-type laser microscope. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021039320-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021220981-A1 |
| priorityDate |
2017-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |