| abstract |
A pattern forming method for forming a pattern on an object surface to be processed, which comprises: a first layer formation step wherein a first layer that contains a compound having a protecting group, which is decomposable by means of an acid and is also decomposable by means of light, is formed on the surface to be processed; a second layer formation step wherein a second layer that contains a photoacid generator which produces an acid by means of light exposure is formed on the first layer; a light exposure step wherein the first layer and the second layer are exposed to light, thereby forming a latent image, which is composed of an exposed region and an unexposed region, in the first layer; and an arrangement step wherein a pattern forming material is arranged in the exposed region or in the unexposed region. |