| abstract |
The invention relates to compounds useful for the deposition of high purity tin oxide. The invention also relates to methods of depositing tin oxide films using such compounds. Such films exhibit high compliance, high etch selectivity and are optically transparent. Such compounds are those of the following formula: wherein: A is selected from the group consisting of (Y a R 'z) and a heterocyclic group containing 3- to 7-membered N; each R group is independently selected from the group consisting of an alkyl or aryl group having 1 to 10 carbon atoms; each R 'is independently selected from the group consisting of alkyl, acyl or aryl having 1 to 10 carbon atoms; x is an integer from 0 to 4; a is an integer of 0 to 1; Y is selected from the group consisting of N, O, S, and P; and z is 1 when Y is 0, S or when Y is absent and z is 2 when Y is N or P. |