http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10975109-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dfcdab27b778da1d6b6420d581d0c2fe |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-2224 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-2284 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-22 |
| filingDate | 2020-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ba4f2302109b2a8f3a84584e17f97d9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7567c928eee5b620f63a608e68724ce7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcfed4dc8927b931c291bd876824ab4c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e15fcb3153779fa12b4dcf41dc462d7c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6fbb53ed37d9689d1114bfa2762409e |
| publicationDate | 2021-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-10975109-B2 |
| titleOfInvention | Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods |
| abstract | A pure composition comprises a monoalkyltin trialkoxide compound represented by the chemical formula RSn(OR′)3 or a monoalkyl tin triamide compound represented by the chemical formula RSn(NR′2)3 and no more than 4 mole % dialkyltin compounds relative to the total tin amount, where R is a hydrocarbyl group with 1-31 carbon atoms, and wherein R′ is a hydrocarbyl group with 1-10 carbon atoms. Methods are described for the formation of the pure compositions. A solid composition comprises a monoalkyl triamido tin compound represented by the chemical formula RSn—(NR′COR″)3, where R is a hydrocarbyl group with 1-31 carbon atoms, and where R′ and R″ are independently a hydrocarbyl group with 1-10 carbon atoms. The compositions are suitable for the formation of resist compositions suitable for EUV patterning in which the compositions have a high EUV absorption. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11300876-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021198293-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021347791-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11673903-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11498934-B2 |
| priorityDate | 2018-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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