| abstract |
The metal oxyfluoride treatment method of the present invention comprises a metal oxyfluoride represented by the general formula MO (6-x) / 2 F x (0 <x <6, M = W or Mo), a fluorine-containing gas And at a temperature of 0 ° C. to less than 400 ° C. to convert into metal hexafluoride represented by the general formula MF 6 (M = W or Mo) by a chemical reaction. In this processing method, metal oxyfluoride can be converted to a substance having a high vapor pressure without using a plasma generator, and it can be used for cleaning of a metal fluoride manufacturing apparatus and cleaning of a film forming apparatus. it can. |